METHOD FOR CLEANING DEPOSITION CHAMBER
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United States of America Patent
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Issued Date -
Oct 27, 2011
app pub date -
Jul 6, 2011
filing date -
May 18, 2011
priority date (Note) -
Abandoned
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Abstract
A method for cleaning a deposition chamber includes the following steps. A steam treatment is carried out on the deposition chamber to remove a contaminant in the deposition chamber by a steam. Then, a vacuum treatment is carried out on the deposition chamber to pump the steam containing the contaminant out of the deposition chamber. A time ratio of the steam treatment to the vacuum treatment is smaller than or equal to 0.65.
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