SUBSTRATE PROCESSING APPARATUS
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United States of America Patent
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Issued Date -
Oct 13, 2011
app pub date -
Nov 19, 2009
filing date -
Nov 21, 2008
priority date (Note) -
Abandoned
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Abstract
A disclosed substrate processing apparatus comprises a reaction chamber; a substrate supporting portion that is provided in the reaction chamber and configured to support a substrate; and plural catalyst reaction portions that are arranged in the reaction chamber in order to oppose the substrate supporting portion, and configured to produce a reaction gas by allowing a source gas introduced from a gas introduction portion to contact a catalyst and to eject the reaction gas to an inner space of the reaction chamber, thereby processing the substrate supported by the substrate supporting portion with the ejected reaction gas.
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