Tapered Horizontal Growth Chamber
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United States of America Patent
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Issued Date -
Oct 13, 2011
app pub date -
Mar 11, 2011
filing date -
Mar 31, 2010
priority date (Note) -
Abandoned
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Abstract
A system and techniques for performing deposition having a tapered horizontal growth chamber which includes a susceptor and a tapered channel flow block. A tapered chamber is formed between the susceptor and the tapered channel flow block. Gaseous species introduced are forced by the tapered channel block to flow toward the susceptor to enhance the efficiency of reactions between the gases species and a wafer on the susceptor.
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