ANTIMICROBIAL, DUSTPROOF FABRIC AND MASK
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United States of America Patent
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Issued Date -
Sep 29, 2011
app pub date -
Jan 31, 2008
filing date -
Feb 1, 2007
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Abandoned
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Abstract
An antimicrobial, dustproof fabric includes a textile material layer which is composed of microfibers with an average fiber diameter of from 1 to 100 μm and contains an inorganic porous substance, and a nanofiber nonwoven fabric layer which is laminated on the textile material layer and has an average fiber diameter of at least 1 nm but less than 1,000 nm. Hygienic products such as masks obtained using the fabric efficiently block microbes such as viruses, and inactivate or destroy the captured microbes.
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