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United States of America Patent
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Issued Date -
Sep 8, 2011
app pub date -
Nov 25, 2009
filing date -
Nov 28, 2008
priority date (Note) -
Abandoned
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Abstract
Provided is a simple method for preventing oligomer deposition onto a film surface. Oligomer deposition onto the surface of a film substrate 11 is prevented by irradiating the film substrate 11 with ultraviolet light at an exposure dosage of 1500 mJ/cm.sup.2 or larger, modifying at least a part of the film substrate 11, and forming a reformed layer 12.
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