Method of making a porous TiO2 photonic film

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United States of America Patent

PATENT NO 9435050
APP PUB NO 20110214998A1
SERIAL NO

12715789

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A porous titanium dioxide film having photonic properties is made by etching a titanium substrate in an electrolyte solution in the presence of an electric field. The electrolyte solution can be an organic electrolyte solution. Etching involves providing an electrolyte solution in contact with a pair of electrodes and passing an electric current through the electrolyte solution. The titanium substrate can be one of the pair of electrodes. The current has a wave profile selected from a group consisting of a periodic square profile, a sine wave, a linear profile, or a quintic profile, and is provided either parallel to or perpendicular to a plane of the substrate.

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Patent Owner(s)

Patent OwnerAddress
CITY UNIVERSITY OF HONG KONGTAT CHEE AVENUE KOWLOON HONG KONG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cheng, Jianwen Hong Kong, CN 1 4
Li, Yang Yang Hong Kong, CN 28 107
Tsang, Chun Kwan Hong Kong, CN 11 16
Xu, Zhengtao Hong Kong, CN 7 9

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