PROCESS FOR PRODUCING SUBSTRATE HAVING PATTERNED CONDUCTIVE POLYMER FILM AND SUBSTRATE HAVING PATTERNED CONDUCTIVE POLYMER FILM
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Sep 1, 2011
app pub date -
Nov 18, 2009
filing date -
Nov 19, 2008
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A process for producing a substrate having a patterned conductive polymer film is provided in which stripping properties are excellent, and discoloration of an end part of the conductive polymer film when a resist film is stripped from the conductive polymer film is suppressed. The process for producing a substrate having a patterned conductive polymer film includes in sequence a step of forming a substrate having in order above the substrate a conductive polymer film and a patterned resist film, a step of etching the conductive polymer film in accordance with the resist film pattern, and a step of stripping the resist film above the conductive polymer film by means of a stripping liquid, the stripping liquid containing an organic solvent (A) at 5 to 40 wt % selected from the group consisting of an N-alkylpyrrolidone, a carboxylic acid amide compound, a dialkyl sulfoxide, and an ether compound and an organic solvent (B) at 60 to 95 wt % selected from the group consisting of an alkyrolactone, an alkylene carbonate, and a polyhydric alcohol.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully