METHOD OF BONDING ROTATABLE CERAMIC TARGETS TO A BACKING STRUCTURE
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United States of America Patent
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Issued Date -
Aug 25, 2011
app pub date -
Feb 17, 2011
filing date -
Feb 19, 2010
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Abandoned
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Abstract
This invention relates to a rotatable cylindrical magnetron sputtering apparatus and related process. More specifically, the invention relates to a cylindrical target assembly for a cylindrical magnetron sputtering device which includes a target portion where the target portion is metal, metal oxide, or ceramic and is not bonded to any backing tube. Instead, the cylindrical target is resiliently, yet fixedly mounted to the backing tube by a multiplicity of resilient, yieldable contacts. The assembly allows the target portion to heat up uniformly and expand, thereby allowing the cylindrical magnetron to operate at increased power levels.
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