Process Gas Confinement for Nano-Imprinting
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United States of America Patent
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Issued Date -
Aug 11, 2011
app pub date -
Feb 8, 2011
filing date -
Feb 9, 2010
priority date (Note) -
Abandoned
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Abstract
Gas confinement systems and methods are described. In particular, systems and methods are described that include a barrier that confines purging gas and restricts flow of purging gas to other elements within a nano-lithography system. The barrier can be adjusted to accommodate and/or control desired pressure variations between working and external environments.
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