Ultra-Compliant Nanoimprint Lithography Template
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United States of America Patent
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Issued Date -
Aug 4, 2011
app pub date -
Jan 31, 2011
filing date -
Jan 29, 2010
priority date (Note) -
Abandoned
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Abstract
An ultra-compliant nanoimprint lithography template having a backing layer and a nanopatterned layer adhered to the backing layer. The nanopatterned layer includes nanoscale features formed by solidifying a polymerizable material in contact with a mold. The polymerizable material includes a fluoroelastomer and a photoinitiator. The backing layer has a higher elastic modulus than the nanopatterned layer. The ultra-compliant nanoimprint lithography template can be used to form multiple high fidelity imprints.
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