RETICLE CLEANING METHOD FOR A LITHOGRAPHY TOOL AND A RETICLE CLEANING SYSTEM THEREOF
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United States of America Patent
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N/A
Issued Date -
Jul 28, 2011
app pub date -
Apr 21, 2010
filing date -
Jan 25, 2010
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A reticle cleaning method for a lithography tool, wherein an inspection apparatus deployed in the lithography tool is used to perform the cleaning procedure on reticle in the EUV reticle pod, the reticle cleaning method comprising: transporting the EUV reticle pod to the upper chamber of the inspection apparatus; forming vacuum in the upper chamber of the inspection apparatus; transporting the inner box of the EUV reticle pod to the lower chamber of the inspection apparatus; forming vacuum in the lower chamber of the inspection apparatus; performing the cleaning process multiple times for gas filling and vacuum exhausting, wherein an inert gas is provided for the process of gas filling to be performed multiple times on the inner box to allow the particles in the inner box to be brought away by the flow field formed by the inert gas in the inner box; and transporting the inner box to a reticle library.
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