LITHOGRAPHY SYSTEM WITH LENS ROTATION
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United States of America Patent
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Issued Date -
Jul 21, 2011
app pub date -
Jan 20, 2011
filing date -
Jan 21, 2010
priority date (Note) -
Abandoned
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Abstract
The invention relates to a charged particle based lithography system for projecting an image on a target using a plurality of charged particle beamlets for transferring said image to said target, said system comprising a charged particle column comprising:an electron optical subassembly comprising a charged particle source, a collimator lens, an aperture array, a blanking means and a beamstop for generating a plurality of charged particle beamlets; anda projector for projecting said plurality of charged particle beamlets on said target;said projector being moveably included in the system by means of at least one projector actuator for moving said projector relative to said electron optical subassembly;said projector actuator being included for mechanically actuating said projector and providing said projector with at least one degree of freedom of movement;wherein said degree of freedom relates to a movement around an optical axis of the system.
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