HYDROPHILIC COATINGS, METHODS FOR DEPOSITING HYDROPHILIC COATINGS AND IMPROVED DEPOSITION TECHNOLOGY FOR THIN FILMS
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United States of America Patent
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Issued Date -
Jul 7, 2011
app pub date -
Feb 28, 2011
filing date -
Dec 3, 2004
priority date (Note) -
Abandoned
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Abstract
The invention provides certain embodiments that involve sputtering techniques for applying a mixed oxide film comprising silica and titania. In these embodiments, the techniques involve sputtering at least two targets in a common chamber (e.g., in a shared gaseous atmosphere). A first of these targets includes silicon, while a second of the targets includes titanium. Further, the invention provides embodiments involving a substrate bearing a hydrophilic coating, which can be deposited by sputtering or any other suitable thin film deposition technique. The invention also provides techniques and apparatuses useful for depositing a wide variety of coating types. For example, the invention provides thin film deposition technologies in which sputtering apparatuses or other thin film deposition apparatuses are employed.
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