METHOD FOR FORMING CONDUCTIVE POLYMER PATTERN
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United States of America Patent
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Issued Date -
Jul 7, 2011
app pub date -
Jul 23, 2009
filing date -
Jul 29, 2008
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Abandoned
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Abstract
The present invention is a method for forming a patterned electroconductive layer containing an electroconductive polymer on a surface of a base body and is characterized in that a positive type photoresist composition containing a naphthoquinone diazide and a novolak resin is used, and that a developer containing a potassium ion at a concentration of 0.08 mol/l to 0.20 mol/l, and a coexistent sodium ion at a concentration of less than 0.1 mol/l is used for development of a resist film obtained by the positive type photoresist composition.
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