PLASMA CVD DEVICE, DLC FILM, AND METHOD FOR DEPOSITING THIN FILM

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United States of America Patent

SERIAL NO

13001089

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between the counter electrode and the holding electrode, and an evacuation mechanism for evacuating the interior of the chamber, wherein the surface area “a” of the holding electrode and the surface area “b” of the counter electrode satisfy a formula below,≧2.

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Patent OwnerAddress
ADVANCED MATERIAL TECHNOLOGIES INC956-1 NISHI-HIRAI NAGAREYAMA-SHI CHIBA 270-0156

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Abe, Koji Nagareyama-shi, JP 339 2689
Hayakawa, Haruhito Nagareyama-shi, JP 4 154
Honda, Yuuji Nagareyama-shi, JP 53 491
Kawabe, Takeharu Nagareyama-shi, JP 3 193

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