Multibeam System
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United States of America Patent
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Issued Date -
Jul 7, 2011
app pub date -
Jan 9, 2009
filing date -
Jan 9, 2008
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Abstract
A multibeam system in which a charged particle beam and one or more additional beams can be directed to the target within a single vacuum chamber. A first beam colunm preferably produces a beam for rapid processing, and a second beam column produces a beam for more precise processing. A third beam column can be used to produce a beam useful for forming an image of the sample while producing little or no change in the sample.
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