GOLD-COATED POLYSILICON REACTOR SYSTEM AND METHOD
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United States of America Patent
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Issued Date -
Jun 30, 2011
app pub date -
Mar 26, 2009
filing date -
Mar 26, 2008
priority date (Note) -
Abandoned
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Abstract
A reaction chamber system, and related devices and methods for use in the system, are provided in which reduced power consumption can be achieved by providing a thin layer of gold on one or more components inside a reaction chamber. The reaction chamber system can be used for chemical vapor deposition. The gold coating should be maintained to a thickness of at least about 0.1 microns, and more preferably about 0.5 to 3.0 microns, to provide a suitable emissivity inside the reaction chamber, and thus reduce heat losses.
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