METHODS FOR REDUCING THE DEPOSITION OF SILICON ON REACTOR WALLS USING PERIPHERAL SILICON TETRACHLORIDE
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United States of America Patent
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Issued Date -
Jun 30, 2011
app pub date -
Dec 23, 2010
filing date -
Dec 29, 2009
priority date (Note) -
Abandoned
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Abstract
Fluidized bed reactor systems and distributors are disclosed as well as processes for producing polycrystalline silicon from a thermally decomposable silicon compound such as trichlorosilane. The processes generally involve reduction of silicon deposits on reactor walls during polycrystalline silicon production by use of a silicon tetrahalide.
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