ANTIREFLECTIVE FILM AND PRODUCTION METHOD THEREOF

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United States of America Patent

APP PUB NO 20110157704A1
SERIAL NO

12994807

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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It is aimed at finding out a surface pattern and physical properties required for an antireflective film having an excellent antireflective property for light, a light transmissivity, and the like, and at providing an antireflective film having such a specific surface pattern and physical properties, and a production method of the antireflective film; and provided for this object, is an antireflective film, obtained by: processing a surface of an aluminum material, by mechanical polishing, chemical polishing and/or electrolytic polishing; subsequently producing a pattern of mold having taper-shaped pores on the surface of the aluminum material, by combining a formation of an anodic oxide coating based on anodic oxidation of the surface of the aluminum material, with etching of the anodic oxide coating; and transferring the pattern of mold onto an antireflective film-forming material; wherein the antireflective film has, on a surface thereof, convexities having an average height between 100 nm inclusive and 1,000 nm inclusive, or concavities having an average depth between 100 nm inclusive and 1,000 nm inclusive, and the convexities or concavities are present at an average period between 50 nm inclusive and 400 nm inclusive, at least in a certain single direction; and wherein the antireflective film has a haze of 15% or less.

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Patent Owner(s)

Patent OwnerAddress
DNP FINE CHEMICALS CO LTD450 AOTO-CHO MIDORI-KU YOKOHAMA-SHI KANAGAWA 2260022 ?2260022

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Matsumoto, Tsukasa Kanagawa, JP 7 31
Rokuhara, Jun Saitama, JP 1 8
Sato, Kazuya Kanagawa, JP 158 1947
Watanabe, Yutaka Saitama, JP 193 2599

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