Inorganic graded barrier film and methods for their manufacture

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United States of America Patent

PATENT NO 10745795
APP PUB NO 20110151173A1
SERIAL NO

12990485

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention refers to a graded barrier film comprising a layered structure, wherein the layered structure comprises a first layer consisting of metal oxide; an intermediate layer consisting of metal nitride or metal oxynitride which is arranged on the first layer; and a third layer consisting of a metal oxide which is arranged on the intermediate layer. The present invention further refers to a sputtering method for manufacturing this graded barrier film and a device encapsulated with this graded barrier film.

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Patent Owner(s)

Patent OwnerAddress
AGENCY FOR SCIENCE TECHNOLOGY AND RESEARCHSINGAPORE

International Classification(s)

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  • 2009 Application Filing Year
  • C23C Class
  • 1395 Applications Filed
  • 820 Patents Issued To-Date
  • 58.79 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2009201020112012201320142015201620172018201920202021202220230255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ramadas, Senthil Kumar Singapore, SG 11 364
Shwe, Zin Ma Singapore, SG 1 47

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Patent Citation Ranking

  • 1 Citation Count
  • C23C Class
  • 58.45 % this patent is cited more than
  • 5 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges1055695351018101 - 1011 - 2021 - 3031 - 4041 - 5051 - 600501001502002503003504004505005506006507007508008509009501000105011001150

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