Coating compositions for photoresists

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United States of America Patent

PATENT NO 9958780
SERIAL NO

12858213

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Abstract

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In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.

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Patent Owner(s)

Patent OwnerAddress
DUPONT ELECTRONIC MATERIALS INTERNATIONAL LLC455 FOREST STREET MARLBOROUGH MA 01752

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gallagher, Michael K Hopkinton, US 91 1302
Trefonas,, III Peter Medway, US 102 645
Wang, Deyan Hudson, US 85 877

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