METAL SILICON NITRIDE OR METAL SILICON OXYNITRIDE SUBMICRON PHOSPHOR PARTICLES AND METHODS FOR SYNTHESIZING THESE PHOSPHORS

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United States of America Patent

SERIAL NO

12883709

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Submicron powders of metal silicon nitrides and metal silicon oxynitrides are synthesized using nanoscale particles of one or more precursor materials using a solid state reaction. For example, nanoscale powders of silicon nitride are useful precursor powders for the synthesis of metal silicon nitride and metal silicon oxynitride submicron powders. Due to the use of the nanoscale precursor materials for the synthesis of the submicron phosphor powders, the product phosphors can have very high internal quantum efficiencies. The phosphor powders can comprise a suitable dopant activator, such as a rare earth metal element dopant.

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Patent Owner(s)

Patent OwnerAddress
NANOGRAM CORPORATION49040 MILMONT DRIVE FREMONT CA 94538

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chiruvolu, Shivkumar San Jose, US 56 1135
Jaiswal, Abhishek Kolkata, IN 7 40
Kambe, Nobuyuki Menlo Park, US 59 1481
Ravilisetty, Padmanabha R Cupertino, US 1 9

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