METHOD AND APPARATUS FOR RECOVERING INDIUM FROM ETCHING WASTE SOLUTION CONTAINING INDIUM AND FERRIC CHLORIDE
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United States of America Patent
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Issued Date -
Jun 9, 2011
app pub date -
Nov 19, 2007
filing date -
Jan 23, 2007
priority date (Note) -
Abandoned
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Abstract
An object is to provide a method and an apparatus for recovering indium, the method and apparatus ensuring that it is unnecessary to recover indium in the form of indium hydroxide, indium can be recovered at a high concentration, indium can be recovered easily by a filter or the like without handling inferiors and also, the recovery rate of indium is greatly improved. The method includes adding a precipitation-inducing metal including a metal having higher ionization tendency than indium to an etching waste solution containing at least indium and ferric chloride, in which the concentration of ferric chloride is adjusted to 20% by weight or less to thereby precipitate indium contained in the etching waste solution on the surface of the precipitation-inducing metal, then, detaching the indium precipitated on the precipitation-inducing metal from the precipitation-inducing metal by a detaching means and separating the detached solid indium or indium alloy from the solution to recover the indium.
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