Concentric Ring Mask for Controlling The Shape of a Planar PN Junction
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United States of America Patent
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Nov 25, 2009
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Nov 25, 2009
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Abstract
A mask for use in making a planar PN junction in a semiconductor device includes a central mask opening and a plurality of spaced apart concentric mask openings surrounding the central mask opening. The concentric mask openings each have a width less than a maximum dimension of the central mask opening. The central mask opening can be circular and the concentric mask openings can have a ring-shape. The mask can be used to form openings in a wafer layer for introducing an impurity to dope that wafer layer.
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