CLEANING METHOD OF APPARATUS FOR DEPOSITING CARBON CONTAINING FILM
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United States of America Patent
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Issued Date -
May 19, 2011
app pub date -
Jul 14, 2008
filing date -
Jul 14, 2008
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Abandoned
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Abstract
A dry cleaning method of an apparatus for depositing a carbon-containing film is provided. The method includes in-situ cleaning an inside of a reactor of the apparatus, wherein the cleaning of the inside of the reactor of the apparatus comprises supplying a cleaning gas including halogens with being activated by using a remote plasma generator to the reactor and simultaneously supplying a carbon-removing gas without being activated to the reactor. In the method, a by-product in a solid form is not generated, and in-situ cleaning can be performed without stopping the apparatus for depositing a carbon-containing film after a predetermined amount of wafers are treated, such that productivity of the apparatus for depositing a carbon-containing film can be maximized.
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