CYLINDRICAL SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME

United States of America Patent

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Issued Date
May 5, 2011
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Jun 9, 2009
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Jun 10, 2008

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Abandoned

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Abstract

Provided is a cylindrical ceramic sputtering target, which significantly reduces the occurrence of a crack, a chip, extraordinary discharge and a nodule.or less.

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Patent Owner	Address
TOSOH CORPORATION	SHUNAN

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Inventor Name	Address	# of filed Patents	Total Citations
Itoh, Kenichi	Ayase-shi, JP	30	177
Shibutami, Tetsuo	Ayase-shi, JP	15	115
Tamano, Kimiaki	Ayase-shi, JP	6	10
Todoko, Shigehisa	Minato-ku, JP	4	8

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CYLINDRICAL SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME

Number of patents in Portfolio can not be more than 2000

United States of America Patent

12997043

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12997043

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