CHAMBER CLEANING METHODS USING FLUORINE CONTAINING CLEANING COMPOUNDS
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United States of America Patent
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Issued Date -
Apr 21, 2011
app pub date -
Oct 14, 2010
filing date -
Oct 16, 2009
priority date (Note) -
Abandoned
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Abstract
Methods of cleaning a process chamber used to fabricate electronics components are described. The methods may include the step of providing a cleaning gas mixture to the process chamber, where the cleaning gas mixture may include a fluorine-containing precursor, and where the cleaning gas mixture removes contaminants from interior surfaces of the processing chamber that are exposed to the cleaning gas mixture. The methods may also include the steps of removing the reaction products of the cleaning gas mixture from the process chamber, and providing a substrate to the process chamber following the evacuation of the reaction products from the process chamber. The cleaning gas mixture may include one or more hydrofluoronated ethers, and the contaminants may include one or more tin-containing contaminants.
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