Microlithographic exposure method as well as a projection exposure system for carrying out the method
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United States of America Patent
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Jul 1, 2014
Grant Date -
Mar 24, 2011
app pub date -
Nov 15, 2010
filing date -
Sep 26, 2003
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Abstract
In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
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