METHOD AND RESULTING STRUCTURE USING SILVER FOR LCOS DEVICES
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United States of America Patent
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N/A
Issued Date -
N/A
app pub date -
Nov 30, 2010
filing date -
Sep 19, 2008
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An LCOS device includes a semiconductor substrate and a plurality of MOS transistors that is formed on a portion of the semiconductor substrate. The LCOS device includes a first dielectric layer overlying the plurality of MOS transistors and a patterned metal layer overlying the first dielectric layer. The patterned metal layer exposes portions of the first dielectric layer that form borders surrounding the patterned metal layer, wherein the patterned metal layer includes a plurality of electrodes. The LCOS device further includes a second dielectric layer overlying the exposed portions of the first dielectric layer. In an embodiment, the patterned metal layer comprises a silver bearing material. Each of the plurality of electrodes has an upper surface having a surface roughness of less than 5 Angstrom and a surface reflectivity of greater than 97% for a light having a wavelength of 500 nanometers and greater.
First Claim
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Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION | 201203 18 ZHANGJIANG ROAD SHANGHAI PUDONG NEW AREA MUNICIPAL DISTRICT SHANGHAI CITY 201203 | |
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION | NO 18 WEN CHANG RD ECONOMIC-TECHNOLOGICAL DEVELOPMENT AREA DAXING DISTRICT BEIJING 100716 |
International Classification(s)

- 2010 Application Filing Year
- H01L Class
- 16510 Applications Filed
- 13147 Patents Issued To-Date
- 79.64 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Lu, Enlian | Shanghai, CN | 4 | 3 |
# of filed Patents : 4 Total Citations : 3 | |||
Xiang, Yanghui Oliver | Shanghai, CN | 2 | 3 |
# of filed Patents : 2 Total Citations : 3 |
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Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 14 Age
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
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Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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