Positive Typed Photosensitive Composition

United States of America Patent

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Issued Date
Mar 3, 2011
app pub date
Dec 30, 2009
filing date
Aug 31, 2009

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Abandoned

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Abstract

Disclosed is a positive typed photosensitive composition including a polyamide derivative represented by the following Chemical Formula, and a heat-acid generator.

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Patent Owner(s)

Patent Owner	Address
KOREA KUMHO PETROCHEMICAL CO LTD	KUMHO BUILDING 57 SHINMUNRO 1-GA CHONGNO-GU SEOUL 336-882

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Cho, Jung Hwan	Seoul, KR	34	434
Lee, Jin Han	Seoul, KR	18	118
Park, Joo Hyeon	Seoul, KR	16	64
Son, Kyung Chul	Seoul, KR	3	0

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Positive Typed Photosensitive Composition

Number of patents in Portfolio can not be more than 2000

United States of America Patent

12649500

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APP PUB NO	20110053080A1
SERIAL NO	12649500
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