Lithography Machine and Substrate Handling Arrangement
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United States of America Patent
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Issued Date -
Mar 3, 2011
app pub date -
Feb 22, 2010
filing date -
Feb 22, 2009
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An arrangement comprising a plurality of charged particle lithography apparatuses, each charged particle lithography apparatus having a vacuum chamber. The arrangement further comprises a common robot for conveying wafers to the plurality of lithography apparatuses, and a wafer load unit for each charged particle lithography apparatus arranged at a front side of each respective vacuum chamber. The plurality of lithography apparatuses are arranged in a row with the front side of the lithography apparatuses facing an aisle accommodating passage of the common robot for conveying wafers to each apparatus, and the rear side of each lithography apparatus faces an access corridor, and the back wall of each vacuum chamber is provided with an access door for access to the respective lithography apparatus.
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