COLOR SYSTEM FOR ETCHING GAS
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United States of America Patent
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Issued Date -
Mar 3, 2011
app pub date -
Aug 11, 2010
filing date -
Aug 28, 2009
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A control system for etching gas is provided. The control system includes a mass flow control unit, a flow rate control unit, and a tuning gas control unit. The mass flow control unit controls a mass flow of an etching gas input to a chamber. The flow rate control unit distributes the etching gas to an upper gas injector and a side gas injector connected with the mass flow control unit and installed in the chamber. The tuning gas control unit distributes and supplies a supplementary gas and tuning gas controlling an ion density and distribution of plasma within the chamber, to the mass flow control unit and the flow rate control unit.
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