Photo-patternable dielectric materials and formulations and methods of use

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United States of America Patent

PATENT NO 8431670
APP PUB NO 20110048787A1
SERIAL NO

12550683

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Abstract

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Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.

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Patent Owner(s)

Patent OwnerAddress
GLOBALFOUNDRIES INCMAPLES CORPORATE SERVICES LIMITED PO BOX 309 UGLAND HOUSE GRAND CAYMAN KY1-1104

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Allen, Robert David San Jose, US 73 809
Brock, Phillip Joe San Jose, US 31 632
Davis, Blake W San Jose, US 14 242
Lin, Qinghuang Yorktown Heights, US 152 2344
Miller, Robert Dennis San Jose, US 97 2092
Nelson, Alshakim San Jose, US 55 648
Sooriyakumaran, Ratnam San Jose, US 126 2309

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