RAPID SUPPLY OF FLUORINE SOURCE GAS TO REMOTE PLASMA FOR CHAMBER CLEANING
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United States of America Patent
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Issued Date -
Feb 24, 2011
app pub date -
Feb 19, 2009
filing date -
Feb 21, 2008
priority date (Note) -
Abandoned
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Abstract
as the source gas for an RPS to form fluorine radicals used in the chamber cleaning operation allows chamber cleaning to proceed at an initial rapid rate without requiring ramp up of the cleaning gas flow. This results in more rapid cleaning and significantly shorter cleaning cycles. This is useful in semiconductor manufacturing, particular, for flat panel displays and solar photo voltaic devices.
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