MEMORY

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United States of America Patent

APP PUB NO 20110037119A1
SERIAL NO

12988125

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Abstract

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A memory includes: a semiconductor substrate (1), a doped source area (2) and a doped drain area (3) set in the semiconductor substrate (1), and a channel area (4) set between said doped source area (2) and said doped drain area (3); a first insulating layer (5) located on the semiconductor substrate (1), a charge memory layer (6) composed of polysilicon located on said first insulating layer (5); an SiGe conducting layer (7) set in said charge memory layer (6).

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Patent Owner(s)

Patent OwnerAddress
GRACE SEMICONDUCTOR MANUFACTURING CORPORATIONNO 818 GUOSHOUJING ROAD ZHANGJIANG HIGH-TECH PARK SHANGHAI 201203

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kong, Weiran Shanghai, CN 17 136

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