Procedure for increasing the long-term stability of transport aids
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United States of America Patent
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Issued Date -
Feb 10, 2011
app pub date -
Jan 27, 2010
filing date -
Jan 27, 2009
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Abandoned
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Abstract
The invention is related to a procedure for the heat treatment of semiconductor elements, which are fed through a process chamber in the continuous-flow procedure. With it, ceramic transport aids used for the transport of the semiconductor elements demonstrate a clearly better long-term mechanical stability compared with known procedures; it is proposed that at least, by way of example, one specific humid atmosphere be adjusted in the process chamber.
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