Polishing Pad and Method of Producing the Same
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United States of America Patent
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Sep 16, 2010
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Jan 12, 2007
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Abstract
The present invention mainly relates to a polishing pad and method of producing the same. The polishing pad comprises a base material having a surface for polishing a substrate, wherein the surface comprises a non-woven fabric and an elastomer. The elastomer is embedded into the fabric, and the non-woven fabric comprises a plurality of first long fibers randomly entangled with each other.
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