METHOD FOR PRODUCING SPUTTERING TARGET CONTAINING BORON, THIN FILM AND MAGNETIC RECORDING MEDIA
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United States of America Patent
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Issued Date -
Jan 6, 2011
app pub date -
Jul 6, 2009
filing date -
Jul 6, 2009
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Abstract
A method for producing a sputtering target containing boron has steps of providing cobalt-chromium (Co·Cr) prealloy powder, mixing Co·Cr prealloy powder and raw material powder containing boron and oxide to form a mixture, preforming the mixture to form a green compact, and sintering the green compact to obtain the sputtering target containing boron. Because Co·Cr prealloy powder is provided, then is mixed with boron, oxide or the like, size and distribution of boride particles can be efficiently controlled. Therefore, Co, Cr, B or the like are uniformly distributed in the sputtering target.
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