INK JET-PRINTABLE COMPOSITION AND A MASKING PROCESS
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United States of America Patent
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Issued Date -
Jan 6, 2011
app pub date -
Mar 2, 2009
filing date -
Mar 26, 2008
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Abandoned
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Abstract
A radiation-curable, ink jet-printable composition comprising a compound having a reactive silyl group that is suitable for use as a masking composition and/or processes in which the composition is applied onto a substrate; the printed composition is exposed to radiation to form a cured image that masks selected areas of the substrate; the unmasked areas of the substrate are modified; and the cured image is treated with an alkaline solution in order to release the cured image from the substrate.
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