Process for the manufacture of at least one ethylene derivative compound
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Dec 30, 2010
app pub date -
Feb 20, 2009
filing date -
Feb 28, 2008
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
Process for the manufacture of at least one ethylene derivative compound starting from a low value residual gas, preferably a ROG, according to which:a) the low value residual gas is subjected to a series of treatment steps in a low value residual gas recovery unit in order to remove the undesirable components present therein and to obtain a mixture of products containing ethylene and other constituents;b) the said mixture of products is separated into a fraction enriched with compounds which are lighter than ethylene, containing part of the ethylene (fraction A), into a fraction enriched with ethylene (fraction B) and into a heavy fraction (fraction C);c) fraction A and fraction B are separately conveyed to the manufacture of at least one ethylene derivative compound.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully