METHOD FOR TREATING HIGH HYDROPHOBIC SURFACE OF SUBSTRATE
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United States of America Patent
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app pub date -
Aug 24, 2010
filing date -
Jun 10, 2009
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Abstract
There is provided a method for treating a surface of a substrate, comprising forming a layer, such as a mixed self-assembled monolayer (SAM), on the surface via chemical vapor deposition (CVD) with a CF3-functionalized organic silane and a CH3-functionalized organic silane, wherein the length of a carbon chain of the CH3-functional organic silane is shorter than a carbon chain of the CF3-functionalized organic silane.
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