ETCHING SOLUTION COMPOSITION
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United States of America Patent
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Issued Date -
Dec 23, 2010
app pub date -
Nov 21, 2008
filing date -
Nov 22, 2007
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Abandoned
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Abstract
Provided is an etching solution composition for selectively etching a metal film, which is composed of Al, Al alloy or the like and is arranged on an amorphous oxide film, from a laminated film including the metal film and an amorphous oxide film of various types. The etching solution composition is used for selectively etching the metal film from the laminated film which includes the amorphous oxide film and the metal film composed of Al, Al alloy, Cu, Cu alloy, Ag or Ag alloy, and is composed of an aqueous solution containing an alkali.
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