METHOD AND SYSTEM FOR CONTINUOUS OR SEMI-CONTINUOUS LASER DEPOSITION
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United States of America Patent
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Issued Date -
Dec 9, 2010
app pub date -
Nov 21, 2008
filing date -
Nov 21, 2007
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Abandoned
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Abstract
The invention relates to a method for deposition of material by laser evaporation wherein the employed laser is a continuous or semi-continuous laser. Using such a laser, it is possible to evaporate the target material in a controlled manner from a local pool of liquid or fluidized target material at the target surface. The invention also provides a system for executing said method.
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