Continuous Feed Chemical Vapor Deposition System
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United States of America Patent
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Issued Date -
Dec 9, 2010
app pub date -
Jun 7, 2009
filing date -
Jun 7, 2009
priority date (Note) -
Abandoned
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Abstract
A continuous feed CVD system includes a wafer transport mechanism that transport a wafer through a deposition chamber during CVD processing. The deposition chamber defines a passage for the wafer to pass through while being transported by the wafer transport mechanism. The deposition chamber includes a plurality of process chambers that are isolated by barriers which maintain separate process chemistry in each of the plurality of process chambers. Each of the plurality of process chambers includes a gas input port and a gas exhaust port, and a plurality of CVD gas sources. At least two of the plurality of CVD gas sources are coupled to the gas input port of each of the plurality of process chambers.
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