CLUSTER E-BEAM LITHOGRAPHY SYSTEM
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Aug 12, 2010
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Oct 26, 2007
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Abstract
A hybrid lithography system is disclosed to achieve high throughput and high resolution of sub 32 nm lithography. The hybrid system contains an optical lithographer for expose pattern area where features above 32 nm, and a cluster E-beam lithography system for expose pattern area where features is sub 32 nm
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