PHOTOCATALYST FILM, PROCESS FOR PRODUCING PHOTOCATALYST FILM, ARTICLE AND METHOD FOR HYDROPHILIZATION

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United States of America Patent

APP PUB NO 20100298120A1
SERIAL NO

12738364

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A photocatalyst film of which at least one main surface contains photo-semiconductor particles; said main surface being a surface that becomes hydrophilic by irradiation with light, wherein the hydrophilization speed thereof when it is irradiated with light having a half-value width of 15 nm or less after kept in a dark place is less than 2 (l/deg/min/10.sup.5) in an irradiated-light wavelength region of 370 nm or more and is 2 (l/deg/min/10.sup.5) or more at least partly in an irradiated-light wavelength region of 300 to 360 nm.

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Patent Owner(s)

Patent OwnerAddress
UBE NITTO KASEI CO LTD1-7 HIGASHI-NIHONBASHI 1-CHOME CHUO-KU TOKYO 103-0004

International Classification(s)

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  • 2008 Application Filing Year
  • B01J Class
  • 1940 Applications Filed
  • 993 Patents Issued To-Date
  • 51.19 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances200820092010201120122013201420152016201720182019202020210255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kitagawa, Takeshi Tokyo, JP 31 203
Suematsu, Daisuke Tokyo, JP 1 4
Takami, Kazuyuki Tokyo, JP 4 53
Tanaka, Naoki Tokyo, JP 131 1515

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Patent Citation Ranking

  • 4 Citation Count
  • B01J Class
  • 7.09 % this patent is cited more than
  • 15 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges4029613443181553211601 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +020406080100120140160180200220240260280300320

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