EXPOSURE METHODS FOR FORMING PATTERNED LAYERS AND APPARATUS FOR PERFORMING THE SAME
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United States of America Patent
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Issued Date -
Nov 18, 2010
app pub date -
May 15, 2009
filing date -
May 15, 2009
priority date (Note) -
Abandoned
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Abstract
Methods include providing an article including a substrate, a first layer supported by the substrate, and an interface between the substrate and the first layer. The substrate is substantially transparent to radiation at a wavelength λ and the first layer is formed from a photoresist. The methods include exposing the first layer to radiation by directing radiation at λ through the substrate to impinge on the interface so that the radiation experiences total internal reflection at the interface.
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