METAL OPTICAL FILTER CAPABLE OF PHOTO LITHOGRAPHY PROCESS AND IMAGE SENSOR INCLUDING THE SAME
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United States of America Patent
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Issued Date -
Nov 11, 2010
app pub date -
May 6, 2010
filing date -
May 11, 2009
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Abandoned
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Abstract
Disclosed is a metal optical filter capable of a photo-lithography process and an image sensor including the same, and more particularly, a metal optical filter capable of a photo-lithography process, which can quite freely adjust the transmission band and transmittance thereof, even with a small number of metal layers, and simultaneously, can be actually applied in a CMOS process because it is possible to achieve nanoscale patterning by the photo-lithography process, and an image sensor including the metal optical filter. The metal optical filter capable of a photo-lithography process includes a plurality of metal rods arranged in parallel with each other at an equal nanoscale interval; and an insulation material formed between the plurality of metal rods and on upper and lower surfaces of the plurality of metal rods, wherein the metal rod is formed to comprise an upper Ti layer, an Al layer, and a lower TiN layer.
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