PROCESS FOR PREPARING A POLYMERIC RELIEF STRUCTURE
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United States of America Patent
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Issued Date -
Nov 4, 2010
app pub date -
May 23, 2008
filing date -
Jun 11, 2007
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Abandoned
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Abstract
The invention relates to a process for the preparation of a polymeric relief structure comprising the steps of coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients, locally treating the coated substrate with electromagnetic radiation having a periodic or random radiation-intensity pattern, forming a latent image, and polymerizing and/or crosslinking the resulting coated substrate, wherein the coating composition comprises one or more RAFT agents.
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