ULTRAVIOLET-RESISTANT MATERIALS AND DEVICES AND SYSTEMS INCLUDING SAME
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United States of America Patent
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Issued Date -
Nov 4, 2010
app pub date -
Mar 13, 2008
filing date -
Mar 30, 2007
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
UV-resistant materials are disclosed that include at least one self-supporting film of UV-resistant clay particles and that are substantially non-reactive to incident UV radiation. An exemplary material is substantially non-transmissive to at least one UV wavelength of less than 300 nm, can include a polymeric material for enhanced flexibility, and can include an additive that is non-transmissive to at least one UV wavelength of greater than 300 nm. The material can be multiple layers of respective clay films. The materials can be used to form UV-resistant devices such as seals, mounting cushions, and light-shields for use in any of various UV-illumination sources and process systems. An example UV-illumination source is an excimer laser. An example system is a light-CVD system.
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International Classification(s)
- C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....
- G21K:TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNET....
- C09D:COATING COMPOSITIONS, e.g. PAINTS, VARNISHES, LACQ....
- G02B:OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- B65D:CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR....
- B32B:LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA....
- C08K:USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUB....
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